The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2017
Filed:
Oct. 09, 2015
Asml Netherlands B.v., Veldhoven, NL;
Anthonius Martinus Cornelis Petrus De Jong, Pijnacker, NL;
Hans Jansen, Eindhoven, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Antonius Johannus Van Der Net, Tilburg, NL;
Peter Franciscus Wanten, Mierlo, NL;
Jacques Cor Johan Van Der Donck, Alphen aan den Rijn, NL;
Robert Douglas Watso, Delevan, NY (US);
Teunis Cornelis Van Den Dool, Delft, NL;
Nadja Schuh, Eindhoven, NL;
Jan Willem Cromwijk, Best, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).