The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2017

Filed:

May. 18, 2016
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Changhyun Lee, Suwon-si, KR;

Dohyun Lee, Hwaseong-si, KR;

Youngwoo Park, Seoul, KR;

Su Jin Ahn, Seoul, KR;

Jaeduk Lee, Seongnam-si, KR;

Assignee:

SAMSUNG ELECTRONICS CO., LTD., Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 11/34 (2006.01); G11C 16/34 (2006.01); G11C 16/10 (2006.01); G11C 16/04 (2006.01); H01L 27/115 (2006.01); H01L 23/528 (2006.01); H01L 29/04 (2006.01); H01L 29/16 (2006.01);
U.S. Cl.
CPC ...
G11C 16/3459 (2013.01); G11C 16/0483 (2013.01); G11C 16/10 (2013.01); H01L 23/528 (2013.01); H01L 27/1157 (2013.01); H01L 27/11524 (2013.01); H01L 27/11526 (2013.01); H01L 27/11556 (2013.01); H01L 27/11573 (2013.01); H01L 27/11582 (2013.01); H01L 29/04 (2013.01); H01L 29/16 (2013.01);
Abstract

Disclosed is a three-dimensional semiconductor memory device, comprising a cell array formed on a first substrate and a peripheral circuit formed on a second substrate that is at least partially overlapped by the first substrate, wherein the peripheral circuit is configured to provide signals for controlling the cell array. The cell array comprises insulating patterns and gate patterns stacked alternately on the first substrate, and at least a first pillar formed in a direction perpendicular to the first substrate and being in contact with the first substrate through the insulating patterns and the gate patterns. The three-dimensional semiconductor memory device further comprising a first ground selection transistor that includes a first gate pattern, adjacent to the first substrate and the first pillar, and a second ground selection transistor that includes a second gate pattern positioned on the first gate pattern and the first pillar, and wherein the first ground selection transistor is not programmable, and the second ground selection transistor is programmable.


Find Patent Forward Citations

Loading…