The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2017
Filed:
Sep. 17, 2013
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Wei Ti Lee, San Jose, CA (US);
Ted Guo, Palo Alto, CA (US);
Steve H. Chiao, San Jose, CA (US);
Alan A. Ritchie, Menlo Park, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 14/16 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45561 (2013.01); C23C 14/165 (2013.01); C23C 16/4402 (2013.01); C23C 16/4404 (2013.01); C23C 16/45565 (2013.01); C23C 16/45591 (2013.01); Y10T 29/497 (2015.01); Y10T 29/49826 (2015.01); Y10T 137/0491 (2015.04); Y10T 137/9029 (2015.04);
Abstract
A system of gas lines for a processing chamber and a method of forming a gas line system for a processing chamber are provided. The system of gas lines includes electropolished multi-way valves that connect electropolished linear gas lines. By using multi-way valves rather than tee-fittings and electropolishing the linear gas lines, the nucleation of contaminating particles in the system of gas lines may be reduced.