The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2017
Filed:
Oct. 15, 2014
Applicant:
Micron Technology, Inc., Boise, ID (US);
Inventors:
Cole S. Franklin, Boise, ID (US);
Jerome A. Imonigie, Boise, ID (US);
Assignee:
MICRON TECHNOLOGY, INC., Boise, ID (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/50 (2006.01); C11D 11/00 (2006.01); C11D 7/04 (2006.01); C11D 7/32 (2006.01); C11D 7/06 (2006.01); C11D 7/08 (2006.01); C11D 7/26 (2006.01); H01L 45/00 (2006.01);
U.S. Cl.
CPC ...
C11D 11/0047 (2013.01); C11D 7/04 (2013.01); C11D 7/06 (2013.01); C11D 7/08 (2013.01); C11D 7/261 (2013.01); C11D 7/3209 (2013.01); C11D 7/3245 (2013.01); H01L 45/06 (2013.01); H01L 45/1233 (2013.01); H01L 45/1253 (2013.01); H01L 45/141 (2013.01); H01L 45/1608 (2013.01);
Abstract
Compositions for removing residues from a semiconductor structure. The compositions comprise water, a base, a polydentate chelator, a degasser, and a fluorine source. The compositions comprise greater than or equal to approximately 99 wt % of the water and are formulated to exhibit a pH of from approximately 10.0 to approximately 12.0. Methods of forming and using the compositions are also disclosed.