The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2017
Filed:
Sep. 29, 2015
Asml Netherlands B.v., Veldhoven, NL;
Milenko Masic, Carlsbad, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In laser-produced plasma (LPP) extreme ultraviolet (EUV) systems, pressure waves and other impulsive disturbances originating from plasma bubble emitting EUV light are created which affect flight of incoming droplets. These disturbances slow the migration of subsequent droplets to the plasma bubble. Because the incoming droplets are slowed, the laser beam does not directly hit the droplet at a primary focus point. This causes the resulting level of EUV light generated to be lower than expected and is manifested as a periodic oscillation in the LPP EUV system. An iterative learning controller (ILC) is used to reduce the periodic oscillations when operating the LPP EUV system in a burst mode or a continuous mode. The ILC, on the rising edge of each burst, uses an error signal collected during a completed burst and the input control signal from the completed burst to update the input control signal for a next burst.