The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2017
Filed:
Sep. 23, 2013
Shanghai Micro Electronics Equipment Co., Ltd., Shanghai, CN;
Tianming Wang, Shanghai, CN;
SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD., Shanghai, CN;
Abstract
A balance mass system shared by a workpiece stage and a mask stage includes a balance mass and an anti-drift and compensation apparatus (). The balance mass includes a first part () for mounting thereon a workpiece stage system, a second part () for mounting thereon a mask stage system, and a third part () for interconnecting the first part () and the second part (). The first part () of the balance mass is floatingly supported on a base frame () of a lithography machine, and the third part () of the balance mass is in connection with the base frame () via the anti-drift and compensation apparatus (). The anti-drift and compensation apparatus () is disposed in proximity to the center of gravity of the balance mass as a whole. This balance mass system can eliminate the need for using an additional support for the mask stage system and allow the construction of a lithography machine with a higher structural compactness, reduced size and weight, and reduced total mass of used balance masses.