The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 07, 2017

Filed:

Jan. 22, 2013
Applicant:

Shin-etsu Handotai Co., Ltd., Tokyo, JP;

Inventors:

Naoki Masuda, Echizen-cho, JP;

Takahiro Yanagimachi, Nishigo-mura, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 15/26 (2006.01); C30B 15/20 (2006.01); C30B 29/06 (2006.01); G01B 11/06 (2006.01); G01B 11/08 (2006.01); G01B 21/08 (2006.01);
U.S. Cl.
CPC ...
C30B 15/26 (2013.01); C30B 15/20 (2013.01); C30B 29/06 (2013.01); G01B 11/0608 (2013.01); G01B 11/08 (2013.01); G01B 21/08 (2013.01); Y10T 117/1008 (2015.01); Y10T 117/1012 (2015.01);
Abstract

A method for calculating a height position of a silicon melt surface at the time of pulling a CZ silicon single crystal is disclosed, including: obtaining a first crystal diameter measured from a fusion ring on a boundary of the silicon melt and the silicon single crystal by using a CCD camera installed at an arbitrary angle relative to the silicon single crystal, and a second crystal diameter measured by using two CCD cameras installed parallel to both ends of a crystal diameter of the silicon single crystal; and calculating the height position of the silicon melt surface in the crucible during pulling of the silicon single crystal from a difference between the first crystal diameter and the second crystal diameter. As a result, a method for enabling further accurately calculating a height position of a silicon melt surface at the time of pulling a silicon single crystal is provided.


Find Patent Forward Citations

Masuda, Naoki. (2017). Method for calculating a height position of silicon melt surface, method for pulling silicon single crystal, and silicon single crystal pulling apparatus (U.S. Patent No. 9587325). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9587325

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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