The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2017
Filed:
Jan. 02, 2008
Hartmut Rohrmann, Schriesheim, DE;
Hanspeter Friedli, Felsberg, CH;
Jürgen Weichart, Balzers, LI;
Stanislav Kadlec, Praha, CZ;
Martin Dubs, Maienfeld, CH;
Hartmut Rohrmann, Schriesheim, DE;
Hanspeter Friedli, Felsberg, CH;
Jürgen Weichart, Balzers, LI;
Stanislav Kadlec, Praha, CZ;
Martin Dubs, Maienfeld, CH;
EVATEC AG, Trubbach, CH;
Abstract
For producing a directional layer for instance with constant nominal directionality, such as a low-retentivity layer with a preferred direction of magnetization or a support layer for such a layer by cathode sputtering on a substrate surface (), the coating process takes place in a manner whereby particles emanating from a target surface () impinge predominantly from directions whose projections onto the substrate surface () lies within a preferred angular range surrounding the nominal direction. This is achieved for instance by positioning a collimator (), encompassing plates () that extend at a normal angle to the substrate surface () parallel to the nominal direction in front of the substrate surface (), but in lieu of or in addition to such positioning the location or movement of the substrate surface () relative to the target surface () can also be suitably adjusted or controlled.