The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2017
Filed:
Jan. 21, 2015
Applicant:
Ultratech, Inc., San Jose, CA (US);
Inventor:
Arthur W. Zafiropoulo, Atherton, CA (US);
Assignee:
Ultratech, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); H01L 21/02 (2006.01); C23C 16/455 (2006.01); C23C 16/507 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02274 (2013.01); C23C 16/401 (2013.01); C23C 16/405 (2013.01); C23C 16/45536 (2013.01); C23C 16/507 (2013.01); H01L 21/0228 (2013.01); H01L 21/02164 (2013.01); H01L 21/02175 (2013.01);
Abstract
A method of performing an oxygen radical enhanced atomic-layer deposition process on a surface of a substrate that resides within an interior of a reactor chamber is disclosed. The method includes forming an ozone plasma to generate oxygen radicals O*. The method also includes feeding the oxygen radicals and a precursor gas sequentially into the interior of the reactor chamber to form an oxide film on the substrate surface. A system for performing the oxygen radical enhanced atomic-layer deposition process is also disclosed.