The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2017

Filed:

Dec. 17, 2009
Applicants:

Harald Gossner, Riemerling, DE;

Ramgopal Rao, Mumbai, IN;

Ram Asra, Mumbai, IN;

Inventors:

Harald Gossner, Riemerling, DE;

Ramgopal Rao, Mumbai, IN;

Ram Asra, Mumbai, IN;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/102 (2006.01); H01L 29/739 (2006.01); H01L 29/66 (2006.01); H01L 21/265 (2006.01); H01L 29/06 (2006.01); H01L 29/165 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7391 (2013.01); H01L 29/66356 (2013.01); H01L 21/26506 (2013.01); H01L 21/26586 (2013.01); H01L 29/0692 (2013.01); H01L 29/165 (2013.01);
Abstract

Tunnel field effect devices and methods of fabricating tunnel field effect devices are described. In one embodiment, the semiconductor device includes a first drain region of a first conductivity type disposed in a first region of a substrate, a first source region of a second conductivity type disposed in the substrate, the second conductivity type being opposite the first conductivity type, a first channel region electrically coupled between the first source region and the first drain region, the first source region underlying a least a portion of the first channel region, and a first gate stack overlying the first channel region.


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