The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2017

Filed:

Feb. 26, 2016
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Fuad Al-Amoody, Rexford, NY (US);

Jinping Liu, Ballston Lake, NY (US);

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 21/8234 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66537 (2013.01); H01L 21/823412 (2013.01); H01L 21/823431 (2013.01);
Abstract

One illustrative method disclosed herein includes, among other things, forming first and second fins, forming a liner layer above at least a first upper surface of the first fin and a second upper surface of the second fin, and forming an ion-containing region in the first portion of the liner layer while not forming the ion-containing region in second portion of the liner layer. The method also includes performing a liner etching process so as to remove the second portion of the liner layer while leaving at least a portion of the first portion of the liner layer positioned above the first fin, and performing at least one etching process to define a reduced-height second fin that is less than an initial first height of the first fin.


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