The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2017
Filed:
Feb. 22, 2006
Applicants:
Kyle S. Lebouitz, Pittsburgh, PA (US);
Edward F. Hinds, Carrow Hill, GB;
Inventors:
Kyle S. Lebouitz, Pittsburgh, PA (US);
Edward F. Hinds, Carrow Hill, GB;
Assignee:
SPTS Technologies Limited, Newport, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67069 (2013.01); H01L 21/67063 (2013.01); H01L 21/67745 (2013.01); H01L 21/67751 (2013.01);
Abstract
In an apparatus for etching a semiconductor wafer or sample (), the semiconductor wafer or sample is placed on a sample holder () disposed in a first chamber (). The combination of the semiconductor wafer or sample and the sample holder is enclosed within a second chamber () inside the first chamber. Gas is evacuated from the second chamber and an etching gas is introduced into the second chamber, but not into the first chamber, to etch the semiconductor wafer or sample.