The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2017
Filed:
May. 29, 2014
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Subhash Deshmukh, Livermore, CA (US);
Joseph Johnson, Redwood City, CA (US);
Jingjing Liu, Sunnyvale, CA (US);
He Ren, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); H01J 37/32 (2006.01); C23F 4/00 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01); H05K 3/02 (2006.01); H01L 21/268 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3065 (2013.01); C23F 4/00 (2013.01); H01J 37/321 (2013.01); H01J 37/32146 (2013.01); H01J 37/32862 (2013.01); H01L 21/02071 (2013.01); H01L 21/268 (2013.01); H01L 21/2686 (2013.01); H01L 21/31116 (2013.01); H01L 21/32135 (2013.01); H01L 21/32136 (2013.01); H05K 3/027 (2013.01); H01J 2237/3343 (2013.01);
Abstract
An apparatus configured to remove metal etch byproducts from the surface of substrates and from the interior of a substrate processing chamber. A plasma is used in combination with a solid state light source, such as an LED, to desorb metal etch byproducts. The desorbed byproducts may then be removed from the chamber.
Quick Actions:
Deshmukh, Subhash. (2017). Process for etching metal using a combination of plasma and solid state sources (U.S. Patent No. 9576810). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9576810
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile