The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2017

Filed:

Nov. 22, 2013
Applicant:

Seb S.a., Ecully, FR;

Inventors:

Camille Giraud, Lyons, FR;

Franck Mandica, Francheville, FR;

Assignee:

SEB S.A., Ecully, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61H 15/00 (2006.01); A61H 7/00 (2006.01); A61N 1/30 (2006.01); A61N 1/04 (2006.01); A61H 15/02 (2006.01); A61H 23/02 (2006.01); A61N 5/06 (2006.01);
U.S. Cl.
CPC ...
A61H 15/0078 (2013.01); A61H 7/007 (2013.01); A61H 15/0085 (2013.01); A61N 1/0428 (2013.01); A61N 1/303 (2013.01); A61H 15/02 (2013.01); A61H 23/02 (2013.01); A61H 2007/009 (2013.01); A61H 2015/0014 (2013.01); A61H 2015/0057 (2013.01); A61H 2201/0188 (2013.01); A61H 2201/10 (2013.01); A61H 2201/105 (2013.01); A61H 2201/1463 (2013.01); A61H 2201/1685 (2013.01); A61H 2205/022 (2013.01); A61N 2005/0659 (2013.01); A61N 2005/0663 (2013.01);
Abstract

A massage device includes a body which contains motor and massage head, where installation mechanism is located between the body and the massage head and said head includes application surface and two massage wheels located along two initial parallel longitudinal axes, which are separated and extend partially outside the application surface. The massage head includes to cause the two wheels to rotate in synchronization and in opposite directions so that, when seen in perpendicular plane to the two axes with the wheels toward the bottom, section of wheel located on the left which extends past the application surface turns counterclockwise and section of wheel located on the right which extends past the application surface turns clockwise. A wheel spacing adjustment system is designed to initially create a minimum distance between the wheels then to adjust the distance to reach a position of equilibrium.


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