The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 07, 2017

Filed:

Apr. 16, 2015
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Vaughn R. Deline, Palo Alto, CA (US);

Geraud J. Dubois, Los Altos, CA (US);

Willi Volksen, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/12 (2006.01); H01L 21/00 (2006.01); H01L 21/768 (2006.01); H05K 3/40 (2006.01); H05K 3/10 (2006.01); H05K 3/42 (2006.01); H05K 3/46 (2006.01); H05K 3/12 (2006.01); H01L 23/522 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76828 (2013.01); H01L 21/76805 (2013.01); H01L 21/76831 (2013.01); H01L 21/76877 (2013.01); H05K 3/4038 (2013.01); H01L 23/5226 (2013.01); H05K 3/10 (2013.01); H05K 3/12 (2013.01); H05K 3/42 (2013.01); H05K 3/46 (2013.01);
Abstract

A technique includes applying a liquid dielectric composition onto a substrate, where the composition includes metal ions, at least partially curing the composition to form a dielectric layer with the metal ions, patterning the dielectric layer to form electron-rich regions at a surface thereof, heating the patterned dielectric layer to drive the metal ions to the electron-rich regions thereof, thereby forming a metal barrier layer on at least a portion of the surface of the dielectric layer, and depositing one or more metal layers onto the metal barrier layer.


Find Patent Forward Citations

Loading…