The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2017
Filed:
Aug. 01, 2012
David Bessems, Eindhoven, NL;
Erik Henricus Egidius Catharina Eummelen, Eindhoven, NL;
Michel Riepen, Veldhoven, NL;
Rogier Hendrikus Magdalena Cortie, Ittervoort, NL;
Adrianes Johannes Baeten, Eindhoven, NL;
Cornelius Maria Rops, Waalre, NL;
David Bessems, Eindhoven, NL;
Erik Henricus Egidius Catharina Eummelen, Eindhoven, NL;
Michel Riepen, Veldhoven, NL;
Rogier Hendrikus Magdalena Cortie, Ittervoort, NL;
Adrianes Johannes Baeten, Eindhoven, NL;
Cornelius Maria Rops, Waalre, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary of a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening at least partly surrounding and radially outward of the meniscus pinning feature; and optionally a gas recovery opening radially outward of the gas supply opening, wherein the gas supply opening, or the gas recovery opening, or both the gas supply opening and the gas recovery opening, has an open area per meter length which has a variation peripherally around the space.