The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2017
Filed:
Apr. 28, 2015
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Joy Cheng, San Jose, CA (US);
Matthew E. Colburn, Schenectady, NY (US);
Chi-Chun Liu, Altamont, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/40 (2006.01); G03F 7/039 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); G03F 7/40 (2013.01); H01L 21/3086 (2013.01);
Abstract
A patterned photoresist is provided atop a substrate. A hardening agent is applied to the patterned photoresist to provide a polymeric coated patterned photoresist. The polymeric coated patterned photoresist is baked to provide a hardened photoresist, and subsequent the baking step, the polymeric coating is removed from the hardened photoresist by rinsing. The hardened photoresist can be removed anytime during the patterning of the substrate by an aqueous resist developer.