The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2017
Filed:
Jun. 06, 2013
Applicants:
Shin-etsu Polymer Co., Ltd., Tokyo, JP;
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Toshiya Sawai, Chiba, JP;
Takayuki Nagasawa, Jyoetsu, JP;
Satoshi Watanabe, Jyoetsu, JP;
Keiichi Masunaga, Jyoetsu, JP;
Assignees:
SHIN-ETSU POLYMER CO., LTD., Tokyo, JP;
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/20 (2006.01); C08K 5/16 (2006.01); G03F 7/09 (2006.01); H01B 1/12 (2006.01); C08K 5/20 (2006.01);
U.S. Cl.
CPC ...
H01B 1/127 (2013.01); C08K 5/20 (2013.01); G03F 7/093 (2013.01); G03F 7/20 (2013.01); G03F 7/2059 (2013.01); G03F 7/2061 (2013.01);
Abstract
The present invention is a conductive polymer composition containing a π-conjugated conductive polymer, a polyanion, and a gemini surfactant. There can be provided a conductive polymer composition that has excellent antistatic performance and excellent application properties, does not adversely affect a resist, and can be suitably used in lithography using electron beam or the like.