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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9557642 B1

PDFFull Text
Date of Patent:
Jan. 31, 2017

Filed:

Aug. 24, 2015

Photoresist composition and associated method of forming an electronic device

Applicant:

Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);

Inventors:

Paul J. LaBeaume, Auburn, MA (US);

Vipul Jain, North Grafton, MA (US);

Suzanne M. Coley, Mansfield, MA (US);

James W. Thackeray, Braintree, MA (US);

James F. Cameron, Brookline, MA (US);

Amy M. Kwok, Shrewsbury, MA (US);

David A. Valeri, Leominster, MA (US);

Assignee:

ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);

Attorney:

Cantor Colburn LLP

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C07C 309/12 (2006.01); C07C 381/12 (2006.01); C08F 220/18 (2006.01); C08F 220/24 (2006.01); C08F 220/28 (2006.01); C08F 220/38 (2006.01); G03F 7/039 (2006.01); G03F 7/16 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); C07C 309/12 (2013.01); C07C 381/12 (2013.01); C08F 220/18 (2013.01); C08F 220/24 (2013.01); C08F 220/28 (2013.01); C08F 220/38 (2013.01); G03F 7/0045 (2013.01); G03F 7/0397 (2013.01); G03F 7/16 (2013.01); G03F 7/20 (2013.01); G03F 7/32 (2013.01); H01L 21/0274 (2013.01);
Abstract

A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.

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