The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2017
Filed:
Aug. 19, 2013
Applicant:
Tanaka Kikinzoku Kogyo K.k., Chiyoda-ku, JP;
Inventors:
Assignee:
Tanaka Kikinzoku Kogyo K.K., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 15/00 (2006.01); C23C 16/18 (2006.01); C23C 16/46 (2006.01);
U.S. Cl.
CPC ...
C07F 15/0046 (2013.01); C23C 16/18 (2013.01); C23C 16/46 (2013.01);
Abstract
The present invention provides a raw material, formed of a ruthenium complex, for producing a ruthenium thin film or a ruthenium compound thin film by a chemical deposition method, wherein the ruthenium complex is a ruthenium complex represented by the following formula, in which carbonyl groups and a fluoroalkyl derivative of a polyene are coordinated to ruthenium. The present invention provides a raw material for chemical deposition having a preferable decomposition temperature, and the production cost therefor is low:(R-L)Ru(CO)  [Chemical Formula 1]