The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 24, 2017

Filed:

Jun. 11, 2015
Applicant:

Mei, Llc, Albany, OR (US);

Inventor:

Scott Tice, Albany, OR (US);

Assignee:

MEI, LLC, Albany, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); H01L 21/67 (2006.01); H01L 21/02 (2006.01); B08B 3/02 (2006.01); B08B 3/04 (2006.01); B08B 3/00 (2006.01); H01L 21/687 (2006.01); H01L 21/677 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67057 (2013.01); B08B 3/00 (2013.01); B08B 3/02 (2013.01); B08B 3/024 (2013.01); B08B 3/04 (2013.01); B08B 3/045 (2013.01); B08B 3/048 (2013.01); H01L 21/02052 (2013.01); H01L 21/0272 (2013.01); H01L 21/30604 (2013.01); H01L 21/6704 (2013.01); H01L 21/6708 (2013.01); H01L 21/67017 (2013.01); H01L 21/67023 (2013.01); H01L 21/67063 (2013.01); H01L 21/67086 (2013.01); H01L 21/67757 (2013.01); H01L 21/68742 (2013.01);
Abstract

In certain embodiments the metal liftoff tool comprises an immersion tank for receiving a wafer cassette with wafers therein, the immersion tank including an inner weir, a lifting and lowering mechanism capable of raising and lowering the wafer cassette while submerged in fluid in the immersion tank, low pressure high velocity primary spray jets for stripping the metal, the primary spray jets positioned at opposing sides of the immersion tank parallel to the wafer surfaces planes, and secondary spray jets for pressure equalization force, positioned at the bottom of the immersion tank. A wafer lift insert is positioned at the bottom of the immersion tank to receive and periodically lift the wafers within the cassette.


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