The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2017
Filed:
Mar. 14, 2014
Applicant:
Shibaura Mechatronics Corporation, Yokohama-shi, Kanagawa, JP;
Inventors:
Konosuke Hayashi, Yokohama, JP;
Masaaki Furuya, Yokohama, JP;
Takashi Ootagaki, Yokohama, JP;
Yuji Nagashima, Yokohama, JP;
Atsushi Kinase, Yokohama, JP;
Masahiro Abe, Yokohama, JP;
Assignee:
SHIBAURA MECHATRONICS CORPORATION, Yokohama-shi, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6704 (2013.01); H01L 21/67028 (2013.01); H01L 21/67034 (2013.01); H01L 21/67115 (2013.01);
Abstract
In a substrate processing devicehaving a heating and drying unitfor drying a surface of a substrate W, the heating and drying unitheats upward a vertically downward surface of the substrate W to dry the surface of the substrate by dropping and removing, by gravity, the droplets of the volatile solvent formed on the surface of the substrate W by the heating operation.