The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2017
Filed:
Aug. 28, 2013
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Blake R. Koelmel, Mountain View, CA (US);
Norman L. Tam, San Jose, CA (US);
Joseph M. Ranish, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V 9/00 (2015.01); F26B 19/00 (2006.01); H01L 21/263 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/2636 (2013.01); H01L 21/67098 (2013.01); H01L 21/67115 (2013.01);
Abstract
Methods and apparatus for processing substrates and controlling the heating and cooling of substrates are described. A radiation source providing radiation in a first range of wavelengths heats the substrate within a predetermined temperature range, the substrate being absorptive of radiation in a second range of wavelengths within the first range of wavelengths and within the predetermined temperature rang. A filter prevents at least a portion of radiation within the second wavelength range from reaching the substrate.