The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 24, 2017

Filed:

Jan. 13, 2016
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Mary P. Kusko, Hopewell Junction, NY (US);

Gary W. Maier, Poughkeepsie, NY (US);

Franco Motika, Hopewell Junction, NY (US);

Phong T. Tran, Highland, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5036 (2013.01);
Abstract

Techniques relate to dynamic complex fault model generation for diagnostics simulation and pattern generation. Inline fabrication parametric data is received, and the inline fabrication parametric data is a collection of physical measurements made on a device under test during a manufacturing fabrication of the device under test. A fault model of defects is generated according to the inline fabrication parametric data, where the fault model is based on a physical design of the device under test combined with the inline fabrication parametric data for the device under test. Test patterns are generated based on the fault model and the inline fabrication parametric data, such that the test patterns are configured to test the device under test in order to obtain results that are based on the inline fabrication parametric data. A simulation is run of the device under test using the results and the inline fabrication parametric data.


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