The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2017
Filed:
Oct. 05, 2010
Jeroen Herman Lammers, Eindhoven, NL;
Sander Frederik Wuister, Eindhoven, NL;
Yvonne Wendela Kruijt-stegeman, Eindhoven, NL;
Roelof Koole, Eindhoven, NL;
Jeroen Herman Lammers, Eindhoven, NL;
Sander Frederik Wuister, Eindhoven, NL;
Yvonne Wendela Kruijt-Stegeman, Eindhoven, NL;
Roelof Koole, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An imprint lithography method is disclosed for forming a patterned layer from an imprintable liquid medium on a substrate by means of an imprint template having a patterned surface. The method involves contacting the patterned surface and imprintable liquid medium together for a filling period. Light emergent (e.g., scattered or reflected) from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an estimated end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be undertaken more rapidly, with reduced risk of defects arising from remnants of unfilled voids. An imprint lithography apparatus and component for putting the method into effect are also disclosed.