The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2017
Filed:
Sep. 01, 2010
Frederick Schmid, Marblehead, MA (US);
David B. Joyce, Marblehead, MA (US);
John Brouillette, Hudson, NH (US);
Daniel P. Betty, Andover, MA (US);
Ryan Philpott, Andover, MA (US);
Frederick Schmid, Marblehead, MA (US);
David B. Joyce, Marblehead, MA (US);
John Brouillette, Hudson, NH (US);
Daniel P. Betty, Andover, MA (US);
Ryan Philpott, Andover, MA (US);
GTAT Corporation, Merrimack, NH (US);
Abstract
A method for minimizing unwanted ancillary reactions in a vacuum furnace used to process a material, such as growing a crystal. The process is conducted in a furnace chamber environment in which helium is admitted to the furnace chamber at a flow rate to flush out impurities and at a predetermined pressure to achieve thermal stability in a heat zone, to minimize heat flow variations and to minimize temperature gradients in the heat zone. During cooldown helium pressure is used to reduce thermal gradients in order to increase cooldown rates.