The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Jan. 31, 2014
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Jian Zhao, San Diego, CA (US);
Tetsuya Ishikawa, San Diego, CA (US);
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05B 1/00 (2006.01); H05G 2/00 (2006.01); B05B 1/02 (2006.01); F02M 61/18 (2006.01); H01J 49/16 (2006.01); B01D 15/08 (2006.01); B41J 2/16 (2006.01); B05B 15/02 (2006.01);
U.S. Cl.
CPC ...
H05G 2/006 (2013.01); B01D 15/08 (2013.01); B05B 1/00 (2013.01); B05B 1/02 (2013.01); B05B 15/02 (2013.01); B05B 15/0208 (2013.01); B41J 2/162 (2013.01); F02M 61/1853 (2013.01); H01J 49/165 (2013.01); H05G 2/008 (2013.01); Y10S 239/19 (2013.01);
Abstract
An EUV light source target material handling system is disclosed which includes a target material dispenser and a target material repository including a nozzle with a radial trench design. The nozzle may be formed from a silicon-on-insulator wafer.