The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Nov. 07, 2014
Globalfoundries Inc., Grand Cayman, KY;
Min Gyu Sung, Latham, NY (US);
Ryan Ryoung-Han Kim, Albany, NY (US);
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
One illustrative method disclosed herein includes, among other things, forming a first plurality of fins in the first region of the substrate, a second plurality of fins in the second region of the substrate, and a space in the substrate between two adjacent fins in the second region that corresponds to a first isolation region to be formed in the second region, forming a fin removal masking layer above the first and second regions of the substrate, wherein the fin removal masking layer has an opening positioned above at least a portion of at least one of the first plurality of fins, while masking all of the second plurality of fins in the second region and the space for the first isolation region, and performing an etching process through the first opening to remove the portions of the at least one of the first plurality of fins.