The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 2017

Filed:

Jan. 10, 2014
Applicant:

Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;

Inventors:

Yasushi Ebizuka, Tokyo, JP;

Seiichiro Kanno, Tokyo, JP;

Naoya Ishigaki, Tokyo, JP;

Masashi Fujita, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01J 37/20 (2006.01); H01J 37/02 (2006.01); H01J 37/28 (2006.01); H01J 37/09 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); H01J 37/026 (2013.01); H01J 37/09 (2013.01); H01J 37/28 (2013.01); H01J 2237/2007 (2013.01);
Abstract

The present invention explains a charged-particle beam device for the purpose of highly accurately measuring electrostatic charge of a sample in a held state by an electrostatic chuck (). In order to attain the object, according to the present invention, there is proposed a charged-particle beam device including an electrostatic chuck () for holding a sample on which a charged particle beam is irradiated and a sample chamber () in which the electrostatic chuck () is set. The charged-particle beam device includes a potential measuring device that measures potential on a side of an attraction surface for the sample of the electrostatic chuck () and a control device that performs potential measurement by the potential measuring device in a state in which the sample is attracted by the electrostatic chuck ().


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