The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Oct. 14, 2004
Applicants:
Takeshi Kawamura, Tokyo, JP;
Koichi Kagawa, Tokyo, JP;
Inventors:
Takeshi Kawamura, Tokyo, JP;
Koichi Kagawa, Tokyo, JP;
Assignee:
EBARA CORPORATION, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
F04C 18/16 (2006.01); F04C 28/08 (2006.01); C23C 16/44 (2006.01); F04C 18/12 (2006.01); F04C 23/00 (2006.01); F04C 25/02 (2006.01); H01J 37/32 (2006.01); F01C 21/00 (2006.01);
U.S. Cl.
CPC ...
F04C 28/08 (2013.01); C23C 16/4412 (2013.01); F01C 21/007 (2013.01); F04C 18/126 (2013.01); F04C 18/16 (2013.01); F04C 23/001 (2013.01); F04C 23/005 (2013.01); F04C 25/02 (2013.01); H01J 37/32834 (2013.01);
Abstract
The present invention relates to an evacuation apparatus for evacuating a vacuum chamber of a substrate processing apparatus for processing a substrate such as a semiconductor wafer or liquid crystal panel. An evacuation apparatus according to the present invention includes a first vacuum pump connected to a vacuum chamber, and a second vacuum pump connected to the first vacuum pump. The first vacuum pump has a pair of multistage pump rotors.