The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Jan. 25, 2016
Applicant:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Inventors:
Masatoshi Echigo, Hiratsuka, JP;
Masako Yamakawa, Hiratsuka, JP;
Assignee:
MITSUBISHI GAS CHEMICAL COMPANY, INC., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07D 311/78 (2006.01); C07C 39/225 (2006.01); C07D 311/96 (2006.01); C07C 37/20 (2006.01); G03F 7/031 (2006.01); G03F 7/038 (2006.01); C07C 39/14 (2006.01); C07C 39/17 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
C07D 311/78 (2013.01); C07C 37/20 (2013.01); C07C 39/14 (2013.01); C07C 39/17 (2013.01); C07C 39/225 (2013.01); C07D 311/96 (2013.01); G03F 7/0045 (2013.01); G03F 7/031 (2013.01); G03F 7/038 (2013.01); G03F 7/20 (2013.01); G03F 7/32 (2013.01); C07C 2101/10 (2013.01); C07C 2101/14 (2013.01);
Abstract
A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.