The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2017

Filed:

Jun. 25, 2015
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Mukta G. Farooq, Hopewell Junction, NY (US);

Andrew J. Martin, Carmel, NY (US);

Jennifer A. Oakley, Poughkeepsie, NY (US);

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/78 (2006.01); H01L 21/00 (2006.01); H01L 21/768 (2006.01); H01L 23/48 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76898 (2013.01); H01L 23/481 (2013.01);
Abstract

A method of forming through silicon vias (TSVs) on integrated circuit (IC) chips and the IC chips. A TSV pattern on a stack of wiring layers on the surface of the IC chip identifies TSV locations. Etching the IC chip TSV pattern opens a cup shaped through hole through the stack to the silicon substrate at each TSV pattern location. The etched stack forms a TSV hard mask open (HMO) for the silicon substrate. Via through holes etched through the silicon substrate masked by the HMO are filled with conductor connecting IC circuits, e.g., to signal lines on the bottom of the chip.


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