The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2017
Filed:
Mar. 13, 2015
Applicant:
Nuflare Technology, Inc., Yokohama, JP;
Inventor:
Osamu Iizuka, Yokohama Kanagawa, JP;
Assignee:
NUFLARE TECHNOLOGY, INC., Yokohama, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3174 (2013.01); H01J 2237/30455 (2013.01); H01J 2237/30483 (2013.01); H01J 2237/31776 (2013.01); H01J 2237/31793 (2013.01);
Abstract
A writing apparatus includes a writing unit to include a deflector for deflecting a charged particle beam and write a pattern on a target object by the charged particle beam, a decision unit to decide a representative position of a deflection result range in which the charged particle beam was deflected with respect to a writing direction by the deflector, and a correction unit to correct drift of the charged particle beam by using a drift amount at the representative position of the deflection result range.