The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2017

Filed:

May. 28, 2014
Applicant:

Institute of Microelectronics, Chinese Academy of Sciences, Beijing, CN;

Inventors:

Mengxin Liu, Beijing, CN;

Xin Liu, Beijing, CN;

Fazhan Zhao, Beijing, CN;

Zhengsheng Han, Beijing, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11C 11/34 (2006.01); G11C 11/419 (2006.01);
U.S. Cl.
CPC ...
G11C 11/34 (2013.01); G11C 11/419 (2013.01);
Abstract

The present invention provides an improved SRAM memory cell based on a DICE structure, which comprises following structures: four inverter structures formed through arranging PMOS transistors and NMOS transistors in series, wherein the part between the drains of a PMOS transistor and an NMOS transistor serves as a storage node; each storage node controls the gate voltage of an NMOS transistor of the other inverter structure and of a PMOS transistor of another inverter structure; a transmission structure consisting of four NMOS transistors, whose source, gate and drain are respectively connected with a bit line/bit bar line, a word line and a storage node. The use of an improved SRAM memory cell based on a DICE structure not only avoids such defects as small static noise margin and being prone to transmission error facing the traditional cell structures consisting of 6 transistors, but also resolves the problem that the current SRAM storage cells based on a DICE structure can easily be affected by the electrical level of storage nodes. This effectively improves reliability of storage cells.


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