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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9533467 B1

PDFFull Text
Expired
Date of Patent:
Jan. 03, 2017

Filed:

Apr. 16, 2013

Imprint material having low mold release property

Applicant:

Nissan Chemical Industries, Ltd., Tokyo, JP;

Inventors:

Junpei Kobayashi, Funabashi, JP;

Taku Kato, Funabashi, JP;

Keisuke Shuto, Funabashi, JP;

Masayoshi Suzuki, Funabashi, JP;

Assignee:

NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

Betelhem Shewareged

Int. Cl.
CPC ...
B32B 3/30 (2006.01); C08J 5/18 (2006.01); H01L 31/0236 (2006.01); H01L 27/146 (2006.01); C09D 4/00 (2006.01); C08F 222/10 (2006.01); G03F 7/00 (2006.01); G03F 7/027 (2006.01); G03F 7/038 (2006.01); G03F 7/075 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
B32B 3/30 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); C08F 222/1006 (2013.01); C08J 5/18 (2013.01); C09D 4/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/027 (2013.01); G03F 7/038 (2013.01); G03F 7/0757 (2013.01); H01L 27/14625 (2013.01); H01L 31/02366 (2013.01); C08J 2333/06 (2013.01); Y10T 428/24802 (2015.01);
Abstract

There is provided an imprint material that allows a resin film to be readily released from a mold at the time of mold release after curing, that is, an imprint material that forms a film having a low mold release property as well as high transparency, high scratch resistance, and a high fingerprint wiping-off property; and a film which is formed from the material and to which a pattern is transferred. An imprint material including: a (A) component: a compound having a propylene oxide unit and two polymerizable groups or a compound having a propylene oxide unit, an ethylene oxide unit, and two polymerizable groups; a (B) component: a silicone compound; and a (C) component: a photopolymerization initiator.

Find Patent Forward Citations

Kobayashi, Junpei. (2017). Imprint material having low mold release property (U.S. Patent No. 9533467). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9533467

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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