The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2017
Filed:
Feb. 26, 2009
Applicants:
Noboru Tachino, Yokkaichi, JP;
Hisayuki Takesue, Yokkaichi, JP;
Harumi Satoh, Yokkaichi, JP;
Inventors:
Assignee:
MITSUBISHI MATERIALS CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 33/107 (2006.01); B01J 19/24 (2006.01); B01J 19/00 (2006.01);
U.S. Cl.
CPC ...
B01J 19/24 (2013.01); B01J 19/0053 (2013.01); C01B 33/10757 (2013.01); B01J 2219/00063 (2013.01); B01J 2219/00135 (2013.01); B01J 2219/00159 (2013.01);
Abstract
A method and an apparatus for manufacturing trichlorosilane are disclosed. A polymer containing high boiling chlorosilane compounds that are generated in a polycrystalline silicon manufacturing process are mixed with hydrogen chloride and introduced into a decomposition furnace. The polymer and the hydrogen chloride are reacted at a temperature of 450° C., and preferably of 450° C. or more and 700° C. or less. Preferably a mixture containing the polymer and hydrogen chloride of 10 to 30 mass % with respect to the weight of the polymer is introduced into the decomposition furnace.