The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2016

Filed:

Dec. 24, 2014
Applicant:

Sumitomo Chemical Company, Limited, Chuo-ku, Tokyo, JP;

Inventors:

Akihisa Terano, Tokyo, JP;

Tomonobu Tsuchiya, Tokyo, JP;

Naoki Kaneda, Tsuchiura, JP;

Tomoyoshi Mishima, Shiki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/15 (2006.01); H01L 31/0256 (2006.01); H01L 29/66 (2006.01); H01L 29/20 (2006.01); H01L 29/732 (2006.01); H01L 29/737 (2006.01); H01L 29/08 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66242 (2013.01); H01L 29/0817 (2013.01); H01L 29/0821 (2013.01); H01L 29/2003 (2013.01); H01L 29/66318 (2013.01); H01L 29/732 (2013.01); H01L 29/7371 (2013.01);
Abstract

Disclosed are an npn-type bipolar transistor as a nitride semiconductor device having good characteristics, and a method of manufacturing the same. A so-called pn epitaxial substrate has a structure wherein an n-type collector layer and a p-type base layer of a three-layer structure are provided over a substrate. The three-layer structure includes first (lower layer side), second, and third (upper layer side) p-type base layers which differ in thickness and p-type impurity concentration. In a partial region inside the second p-type base layer located as an intermediate layer in the p-type base layer of the three-layer structure, an n-type emitter region is formed by ion implantation.


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