The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2016

Filed:

Jun. 25, 2015
Applicant:

Western Digital (Fremont), Llc, Fremont, CA (US);

Inventors:

Li He, Fremont, CA (US);

Jikou Zhou, Pleasanton, CA (US);

Ge Yi, San Ramon, CA (US);

Dujiang Wan, Fremont, CA (US);

Fujian Wang, San Ramon, CA (US);

Assignee:

WESTERN DIGITAL (FREMONT), LLC, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/147 (2006.01); G11B 5/31 (2006.01); G11B 5/60 (2006.01); G11B 5/127 (2006.01);
U.S. Cl.
CPC ...
G11B 5/6082 (2013.01); G11B 5/1278 (2013.01); G11B 5/1475 (2013.01); G11B 5/3163 (2013.01); G11B 5/3173 (2013.01);
Abstract

A method provides a magnetic write apparatus on a substrate. A mask is provided on a substrate. The mask has a trench therein. The trench has a top, a bottom and a plurality of sidewalls extending between the top and the bottom of the trench. The top of the trench is wider than the bottom. A protective layer is provided in the trench. The protective layer extends from the top of the trench along a first portion of the plurality of sidewalls such that the bottom of the trench and a second portion of the plurality of sidewalls are free of the protective layer. The structure is provided in a remaining portion of the trench.


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