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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9529259 B1

PDFFull Text
Date of Patent:
Dec. 27, 2016

Filed:

Aug. 17, 2015

Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound

Applicant:

Jsr Corporation, Tokyo, JP;

Inventor:

Hayato Namai, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Sin Lee

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); C07C 59/185 (2006.01); C07C 59/205 (2006.01); C07C 59/84 (2006.01); C07C 59/21 (2006.01); C07C 69/36 (2006.01); C07C 381/12 (2006.01); C07D 307/77 (2006.01); C07D 313/04 (2006.01); C07D 317/46 (2006.01); C07D 317/72 (2006.01); C07D 327/04 (2006.01); C07D 313/10 (2006.01); C07D 307/93 (2006.01); C07D 315/00 (2006.01); C07C 51/41 (2006.01); C07C 327/32 (2006.01); C07C 67/30 (2006.01); C07C 51/02 (2006.01); C08F 212/14 (2006.01); G03F 7/038 (2006.01); C08F 2/38 (2006.01); C08F 4/00 (2006.01); C07C 69/63 (2006.01); C07C 327/06 (2006.01); C08F 12/24 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 51/02 (2013.01); C07C 51/41 (2013.01); C07C 59/185 (2013.01); C07C 59/205 (2013.01); C07C 59/21 (2013.01); C07C 59/84 (2013.01); C07C 67/30 (2013.01); C07C 69/36 (2013.01); C07C 69/63 (2013.01); C07C 327/06 (2013.01); C07C 327/32 (2013.01); C07C 381/12 (2013.01); C07D 307/77 (2013.01); C07D 307/93 (2013.01); C07D 313/04 (2013.01); C07D 313/10 (2013.01); C07D 315/00 (2013.01); C07D 317/46 (2013.01); C07D 317/72 (2013.01); C07D 327/04 (2013.01); C08F 2/38 (2013.01); C08F 4/00 (2013.01); C08F 12/24 (2013.01); C08F 212/14 (2013.01); G03F 7/004 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01); C07C 2101/08 (2013.01); C07C 2101/14 (2013.01); C07C 2101/18 (2013.01); C07C 2103/74 (2013.01);
Abstract

A radiation-sensitive resin composition includes a polymer including a structural unit that includes an acid-labile group; and a compound represented by formula (1). Rrepresents a monovalent organic group having 1 to 30 carbon atoms. L represents a single bond, an oxygen atom or a sulfur atom. Mrepresents a monovalent radioactive ray-labile onium cation. The monovalent organic group represented by Ris preferably a monovalent hydrocarbon group or a monovalent fluorinated hydrocarbon group, and L preferably represents a single bond. The monovalent organic group represented by Ris preferably a monovalent hydrocarbon group, a monovalent fluorinated hydrocarbon group, a monovalent aliphatic heterocyclic group or a monovalent fluorinated aliphatic heterocyclic group, and L preferably represents an oxygen atom or a sulfur atom. The monovalent radioactive ray-labile onium cation represented by Mis preferably represented by the formula (X).

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