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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9527936 B1

PDFFull Text
Date of Patent:
Dec. 27, 2016

Filed:

Aug. 24, 2015

Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method

Applicant:

Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);

Inventors:

Vipul Jain, North Grafton, MA (US);

Paul J. LaBeaume, Auburn, MA (US);

James W. Thackeray, Braintree, MA (US);

James F. Cameron, Brookline, MA (US);

Suzanne M. Coley, Mansfield, MA (US);

Amy M. Kwok, Shrewsbury, MA (US);

David A. Valeri, Leominster, MA (US);

Assignee:

ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);

Attorney:

Cantor Colburn LLP

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); C08F 22/10 (2006.01); C07C 309/12 (2006.01); C07C 381/12 (2006.01); C08F 220/18 (2006.01); C08F 220/24 (2006.01); C08F 220/28 (2006.01); C08F 220/38 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
C08F 22/10 (2013.01); C07C 309/12 (2013.01); C07C 381/12 (2013.01); C08F 220/18 (2013.01); C08F 220/24 (2013.01); C08F 220/28 (2013.01); C08F 220/38 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/20 (2013.01); G03F 7/38 (2013.01); H01L 21/0274 (2013.01); H01L 21/0275 (2013.01);
Abstract

A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

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