The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2016
Filed:
May. 22, 2015
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Yoshinori Hirobe, Tokyo, JP;
Yutaka Matsumoto, Tokyo, JP;
Masato Ushikusa, Tokyo, JP;
Toshihiko Takeda, Tokyo, JP;
Hiroyuki Nishimura, Tokyo, JP;
Katsunari Obata, Tokyo, JP;
Takashi Takekoshi, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
Provided are: a vapor deposition mask which can be light weight and have high definition even when the size is increased; a method for producing a vapor deposition mask device whereby it is possible to accurately position the aforementioned vapor mask on a frame; and a method for producing an organic semiconductor element whereby it is possible to produce a high-definition organic semiconductor element. A metal mask on which slits are disposed, and a resin mask which is positioned on the surface of the metal mask and on which multiple openings corresponding to the pattern formed by means of vapor deposition are horizontally and vertically arranged in rows are laminated.