The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2016

Filed:

Apr. 19, 2013
Applicant:

Intevac, Inc., Santa Clara, CA (US);

Inventors:

Terry Bluck, Santa Clara, CA (US);

Ian Latchford, Palo Alto, CA (US);

Vinay Shah, San Mateo, CA (US);

Alex Riposan, Palo Alto, CA (US);

Assignee:

INTEVAC, INC., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); C23C 14/50 (2006.01); C23C 16/04 (2006.01); C23C 16/458 (2006.01); H01L 21/673 (2006.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
H01L 31/1892 (2013.01); C23C 14/042 (2013.01); C23C 14/50 (2013.01); C23C 16/042 (2013.01); C23C 16/4585 (2013.01); H01L 21/6734 (2013.01); H01L 21/67346 (2013.01); H01L 31/18 (2013.01);
Abstract

An arrangement for supporting substrates during processing, having a wafer carrier with a susceptor for supporting the substrate and confining the substrate to predetermined position. An inner mask is configured for placing on top of the substrate, the inner mask having an opening pattern to mask unprocessed parts of the substrate, but expose remaining parts of the substrate for processing. An outer mask is configured for placing on top of the inner mask, the outer mask having an opening that exposes the part of the inner mask having the opening pattern, but cover the periphery of the inner mask.


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