The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2016

Filed:

Dec. 01, 2014
Applicant:

Invensas Corporation, San Jose, CA (US);

Inventors:

Chang Myung Ryu, Cupertino, CA (US);

Kimitaka Endo, Tokyo, JP;

Belgacem Haba, Saratoga, CA (US);

Yoichi Kubota, Pleasanton, CA (US);

Assignee:

Invensas Corporation, San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); H01L 21/48 (2006.01); H01L 23/498 (2006.01); B81C 1/00 (2006.01); C25D 7/00 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 24/19 (2013.01); B81C 1/00539 (2013.01); C25D 7/00 (2013.01); H01L 21/4846 (2013.01); H01L 21/768 (2013.01); H01L 23/498 (2013.01); H01L 2924/0002 (2013.01); H01L 2924/12042 (2013.01);
Abstract

A microelectronic interconnect element can include a plurality of first metal lines and a plurality of second metal lines interleaved with the first metal lines. Each of the first and second metal lines has a surface extending within the same reference plane. The first metal lines have surfaces above the reference plane and remote therefrom and the second metal lines have surfaces below the reference plane and remote therefrom. A dielectric layer can separate a metal line of the first metal lines from an adjacent metal line of the second metal lines.


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