The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2016

Filed:

Mar. 10, 2014
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Steve S. Hongkham, San Ramon, CA (US);

Paul B. Reuter, Austin, TX (US);

Eric A. Englhardt, Palo Alto, CA (US);

Ganesh Balasubramanian, Fremont, CA (US);

Xinglong Chen, San Jose, CA (US);

JuanCarlos Rocha-Alvarez, San Carlos, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J 19/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67184 (2013.01); Y10T 137/0318 (2015.04); Y10T 137/86187 (2015.04);
Abstract

A via pass-through apparatus is disclosed. The via pass-through apparatus includes a pass-through chamber adapted to couple between a first mainframe section and a second mainframe section of a substrate processing system, the pass-through chamber including an entry and an exit each having a slit valve, and a via process chamber located at a different level than the pass-through chamber wherein the via process chamber is adapted to carry out a process on a substrate at the via location. Systems and methods of operating the system are provided, as are numerous other aspects.


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