The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2016
Filed:
May. 20, 2014
Jsr Corporation, Tokyo, JP;
JSR CORPORATION, Tokyo, JP;
Abstract
The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO, wherein a hydrogen atom or an electron-donating group bonds to an α carbon atom with respect to SO, and an electron-withdrawing group bonds to a β carbon atom with respect to SO; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), Rand Reach independently represent a hydrogen atom or a monovalent electron-donating group. Rrepresent a monovalent electron-withdrawing group. Rrepresents a hydrogen atom or a monovalent hydrocarbon group.