The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2016
Filed:
Dec. 20, 2012
Lintec Corporation, Itabashi-ku, Tokyo, JP;
Kentaro Kusama, Tokyo, JP;
Tomoo Orui, Tokyo, JP;
Kenta Tomioka, Tokyo, JP;
Satoru Shoshi, Tokyo, JP;
LINTEC CORPORATION, Tokyo, JP;
Abstract
A method for producing a light diffusion film having first and second louver structure regions includes the following steps (a) to (d): (a) preparing a composition for light diffusion film; (b) applying the composition for light diffusion film, and forming a coating layer; (c) performing first active energy ray irradiation, and forming a first louver structure region in the lower part of the coating layer, while leaving a louver structure-unformed region in the upper part of the coating layer; and (d) performing second active energy ray irradiation, and forming a second louver structure region in the louver structure-unformed region.