The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2016

Filed:

Sep. 30, 2014
Applicant:

Pixar, Emeryville, CA (US);

Inventors:

Robert Sumner, Zurich, CH;

Fabian Hahn, Sprietenbach, CH;

Bernhard Thomaszewski, Zurich, CH;

Stelian Coros, Zurich, CH;

Forrester Cole, Berkeley, CA (US);

Mark Meyer, San Francisco, CA (US);

Anthony Derose, San Rafael, CA (US);

Markus Gross, Uster, CH;

Assignees:

PIXAR, Emeryville, CA (US);

ETH ZÜRICH, Zürich, CH;

Disney Enterprises, Inc., Burbank, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 13/40 (2011.01);
U.S. Cl.
CPC ...
G06T 13/40 (2013.01); G06T 2210/16 (2013.01);
Abstract

A method of animation of surface deformation and wrinkling, such as on clothing, uses low-dimensional linear subspaces with temporally adapted bases to reduce computation. Full space simulation training data is used to construct a pool of low-dimensional bases across a pose space. For simulation, sets of basis vectors are selected based on the current pose of the character and the state of its clothing, using an adaptive scheme. Modifying the surface configuration comprises solving reduced system matrices with respect to the subspace of the adapted basis.


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