The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2016

Filed:

Nov. 21, 2014
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Oliver D. Patterson, Poughkeepsie, NY (US);

Yunsheng Song, Poughkeepsie, NY (US);

Zhigang Song, Hopewell Junction, NY (US);

Yongchun Xin, Poughkeepsie, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/36 (2012.01); H01L 23/522 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G03F 1/36 (2013.01); G06F 17/5072 (2013.01); G06F 17/5081 (2013.01); H01L 22/30 (2013.01); H01L 23/5226 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A method for designing, a structure, method of inspecting and a computer system for designing voltage contrast integrated circuit characterization. The design method includes selecting a design level of a mask design shapes file; selecting a region of the design level having an open region having no design shapes and an adjacent circuit region having circuit design shapes; selecting a sub-region of the circuit region adjacent to the open region; copying design shapes of the sub-region to generate a characterization cell identical to the sub-region; modifying the characterization cell to generate a passive voltage contrast characterization cell; and placing the passive voltage contrast characterization cell into the open region adjacent to the sub-region to generate a modified design level.


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