The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2016

Filed:

Mar. 17, 2011
Applicants:

Chen-kuang Lien, Kaohsiung, TW;

Lun-chieh Chiu, Tongxiao Township, Miaoli County, TW;

Yu-min Chang, Hsinchu, TW;

Inventors:

Chen-Kuang Lien, Kaohsiung, TW;

Lun-Chieh Chiu, Tongxiao Township, Miaoli County, TW;

Yu-Min Chang, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 7/12 (2006.01); C25D 21/12 (2006.01); H01L 21/288 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
C25D 7/123 (2013.01); C25D 21/12 (2013.01); H01L 21/2885 (2013.01); H01L 21/76877 (2013.01); H01L 21/76843 (2013.01); H01L 21/76864 (2013.01);
Abstract

A method for electrochemical plating includes providing a wafer for an electrochemical plating (ECP) process, determining a wafer electrical property affecting the ECP process, adjusting a plating current or voltage applied in the ECP process based on the determined wafer electrical property, and electroplating the wafer with the adjusted plating current or voltage. A controller for controlling a power supply, and a system for electrochemical plating are also disclosed.


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