The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2016

Filed:

Aug. 27, 2014
Applicant:

Mitsubishi Materials Corporation, Tokyo, JP;

Inventors:

Satoru Mori, Okegawa, JP;

Toshio Sakamoto, Kitamoto, JP;

Kiyoyuki Ookubo, Iwaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C22C 9/00 (2006.01); H01J 37/34 (2006.01); C22C 1/04 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); C22C 1/0425 (2013.01); C22C 9/00 (2013.01); H01J 37/3426 (2013.01);
Abstract

A copper alloy sputtering target is made of a copper alloy having a composition containing Ca in a range of 0.3 mass % to 1.7 mass % with a remainder of Cu and inevitable impurities, a Ca-segregated phase () in which Ca is segregated is dispersed in a matrix phase, and the Ca-segregated phase contains a Cu-dispersed phase () made of Cu.


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